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英國Nanobean NB5 電子束光刻機
具有良好的穩(wěn)定性，平均正常運行時間超過93%
規(guī)格:
束流電壓范圍為: 20kV - 100kV
光刻膠的特征尺寸: <8nm (光刻精度)
500um區(qū)域拼接/疊加誤差: 小于25nm
自動裝載5卡盤氣鎖系統(tǒng)
NB5發(fā)展目標:
改進設(shè)計和組件以減少日常服務(wù)需求。
實現(xiàn)每年少于5%的機器故障停機時間。
提高性能
便于批量生產(chǎn)。
NB5系統(tǒng)將為進一步發(fā)展高偏轉(zhuǎn)速度和進一步集成電子提供平臺。
The nB4 is a generation ahead of the current competition and with its field-proven performance has gained acceptance in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB5 which has been developed to further reduce delivery times and service costs.
NB5 development aims:
Refine design and components to reduce routine service requirements.
Achieve a machine-fault-downtime of less than 5% annually.
Enhance performance
Facilitate volume production.
Specification:
Beam Voltage range 20kV - 100kV
Feature size on resist <8nm
Stitching/overlay error <25nm for 500um field
Automatic loading 5 chuck airlock system
The nB5 system will provide a platform for further development to high deflection speed and further integrated electronics.
暫無數(shù)據(jù)！
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手機版：
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